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. 2024 Dec 14;14(24):2013. doi: 10.3390/nano14242013

Figure 5.

Figure 5

Figure 5

At three distinct post-annealing temperatures, surface roughness was measured for ITO thin films on Si using 3D AFM: (a) as deposited, (b) 500 °C, (c) 600 °C, and (d) 700 °C. Reproduced from [37] with permission from the copyright clearance center.