| ALD | Atomic layer deposition |
| DP | Direct plasma |
| CTL | Charge-trapping layer |
| CTM | Charge-trapping memory |
| MHOTM | Sin++/HfO2/Al2O3/TiO2/Al |
| PE | Plasma-enhanced |
| P/E | Program/erase |
| RP | Remote plasma |
| ALD | Atomic layer deposition |
| DP | Direct plasma |
| CTL | Charge-trapping layer |
| CTM | Charge-trapping memory |
| MHOTM | Sin++/HfO2/Al2O3/TiO2/Al |
| PE | Plasma-enhanced |
| P/E | Program/erase |
| RP | Remote plasma |