Figure 5.
(a) An SEM cross-section of a 220 nm SOI photonic chip, planarized with HSQ. No etching has been performed yet. (b) An SEM cross-section of a 220 nm SOI photonic chip planarized with HSQ, after etching and BaTiO3 deposition. (c) An SEM top view of the dense BaTiO3 film successfully grown on a waveguide structure.