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. 2025 Mar 13;16(3):334. doi: 10.3390/mi16030334

Figure 5.

Figure 5

(a) An SEM cross-section of a 220 nm SOI photonic chip, planarized with HSQ. No etching has been performed yet. (b) An SEM cross-section of a 220 nm SOI photonic chip planarized with HSQ, after etching and BaTiO3 deposition. (c) An SEM top view of the dense BaTiO3 film successfully grown on a waveguide structure.