Table 2.

Manual count of AuNp per size class derived from TEM analysis of the samples

Sample name	Lamella width [µm]	AuNp count per size class, normalized to lamella width [1/µm]													AuNp—SiNc distance [nm]
		< 10 nm	10 nm	20 nm	30 nm	40 nm	50 nm	60 nm	70 nm	80 nm	90 nm	100 nm	110 nm	120 nm
A0_N3	3.58	44	1.7	10.3	6.7	0.28	0	0.28	0.84	0.84	0.56	0.28	0	0.28	20 to 40
A2_N1	5.13	43	0	0	0.58	0.2	0.2	0.2	0.39	0.39	0.58	0	0.58	0	30 to 50
A3_N0	0.9	118	7.8	3.3	1.1	0	2.2	0	0	0	0	0	0	0	100

Counts are normalized to the lamella width. The distance between AuNp larger than 10 nm and SiNc containing SiO_x layer is shown. Similar TEM images as in Figure SM1 (in supplementary material) were used to provide this data (images not shown). Please note that this data is intended as an approximation and should be used for general orientation only