Table 1.
Performance metrics for traditional and high-entropy oxide memristors
| Material system | Representative material | Forming-free | ON/OFF ratio | Endurance | Retention | Switching speed/energy | Multilevel states | CMOS compatibility CMOS | Refs. |
|---|---|---|---|---|---|---|---|---|---|
| Binary-oxides | HfO2 | No | ≈103–104 | 1.2 × 1011 | 3 × 108 s (ext.) | 5 ns/– | 24 | Yes | [117] |
| TiO2-C oO | Yes | ~ 103 | 1 × 103 | 1 × 104 s | –/0.4 V, 2.5 µA (~ 1 µW) | ✓ (via Vstop) | Yes | [118] | |
| Perovskites | MAPbI3 quantum wires | Yes | 1 × 107 | 6 × 106 | > 2 years (ext.) | ~ 100 ps/– | 4 | Limited | [119] |
| 2D Materials | MoS2 | No | ~ 105 | – | 104 s | ns/– | 5 | Limited | [120] |
| Organic polymers | Hetero-electrolyte polymer | No | 1 × 103 | 2 × 102 | – | – | – | Limited | [121] |
| HEOs | (Zr, Hf, Nb, Ta, Mo, W)2O5−x | Yes | 6–15 | 7 × 104 | 7.2 × 104 s | – | 64 | Yes | [33] |
| (Cr, Mn, Fe, Co, Ni)3O4 | Yes | 1 × 105 | 4.5 × 103 | > 104 s | – | 32 (analog) | Yes | [32] |