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. 2026 May 1;19(9):1861. doi: 10.3390/ma19091861
TSV Through-Silicon Via
UPD Ultra-Precise Dispensing
3D ICs Three-Dimensional Integrated Circuits
CMP Chemical–Mechanical Polishing
AM Additive Manufacturing
IJ Inkjet
EHD Electrohydrodynamic
CMOS Complementary Metal–Oxide Semiconductor
PECVD Plasma-Enhanced Chemical Vapor Deposition
EBE E-Beam Evaporation
LOP Lift-Off Process
RIE Reactive Ion Etching
DRIE Deep Reactive Ion Etching
ALD Atomic Layer Deposition
SEM Scanning Electron Microscopy
PFIB Plasma Focused Ion Beam
CTE Coefficient of Thermal Expansion
TCT Thermal Cycling Tests
EM Electromigration