| TSV | Through-Silicon Via |
| UPD | Ultra-Precise Dispensing |
| 3D ICs | Three-Dimensional Integrated Circuits |
| CMP | Chemical–Mechanical Polishing |
| AM | Additive Manufacturing |
| IJ | Inkjet |
| EHD | Electrohydrodynamic |
| CMOS | Complementary Metal–Oxide Semiconductor |
| PECVD | Plasma-Enhanced Chemical Vapor Deposition |
| EBE | E-Beam Evaporation |
| LOP | Lift-Off Process |
| RIE | Reactive Ion Etching |
| DRIE | Deep Reactive Ion Etching |
| ALD | Atomic Layer Deposition |
| SEM | Scanning Electron Microscopy |
| PFIB | Plasma Focused Ion Beam |
| CTE | Coefficient of Thermal Expansion |
| TCT | Thermal Cycling Tests |
| EM | Electromigration |