Table 2. The details of 29 mask patterns at the N7 technology node with an 18 nm CD.

Line (nm)	Space (nm)	Line/space ratio	Pitch (nm)
18	18	1 : 1.0000	36
18	22	1 : 1.2222	40
18	26	1 : 1.4444	44
18	30	1 : 1.6667	48
18	34	1 : 1.8889	52
18	38	1 : 2.1111	56
18	42	1 : 2.3333	60
18	46	1 : 2.5556	64
18	50	1 : 2.7778	68
18	54	1 : 3.0000	72
18	61	1 : 3.3889	79
18	67	1 : 3.7222	85
18	74	1 : 4.1111	92
18	81	1 : 4.5000	99
18	87	1 : 4.8333	105
18	94	1 : 5.2222	112
18	100	1 : 5.5556	118
18	107	1 : 5.9444	125
18	114	1 : 6.3333	132
18	120	1 : 6.6667	138
18	127	1 : 7.0556	145
18	134	1 : 7.4444	152
18	140	1 : 7.7778	158
18	147	1 : 8.1667	165
18	153	1 : 8.5000	171
18	160	1 : 8.8889	178
18	167	1 : 9.2778	185
18	173	1 : 9.6111	191
18	180	1 : 10.0000	198