FIG. 1.

Substrates. (A) Schematic of substrate construction from six oligomers by ligation. The arm fragments AF1 to AF4 are 95, 94, 90, and 91 nt in length, respectively. The length and sequences of damaged oligomers and complementary sequence (CF) for UV- and AAF-damaged substrates are shown. Asterisks indicate the positions of the radiolabel in duplexes used for footprinting and for the excision assay. (B) Sequence of the T<>T or (6-4) photoproduct-containing duplex. The triangle indicates position of the photoproduct.