. Author manuscript; available in PMC: 2008 Mar 1.

Published in final edited form as: Biochim Biophys Acta. 2006 Oct 21;1773(3):321–329. doi: 10.1016/j.bbamcr.2006.10.009

Table VI.

Phenotypic screens for yeast AKR mutants

Phenotype	Screening agent/parameter	References
Heat shock	Loss of viability following heat shock up to 55°C	[44,45]
Oxidative stress	YPD + 0.88 mM hydrogen peroxide	[46,47]
	YPD + 1.5 mM diamide	[48]
	YPD + 10 μM paraquat	[49]
Osmotic stress	YPD + 1 M sorbitol YPD + 1 M NaCl
Temperature sensitivity	Growth at 37°C, YPD
Growth/morphology	Growth rate (doubling time)
	Viability (exclusion of propidium iodide)
	Budding pattern (light microscopy)
	Calcofluor sensitivity (YPD + 0.1% calcofluor)	[50]
Carbon auxotrophy	YP + 2% glucose YP + 2% galactose YP + 2% raffinose YP + 2% maltose YP + 2% sucrose YP + 3% glycerol YP + 2% potassium Acetate
Nitrogen starvation	Loss of growth on nitrogen-free medium	[45]
Signal transduction	YPD + 10 mM caffeine	[51]
	YPD + 0.1 μg/ml staurosporine	[52]
Nucleic acid metabolism	YPD + 0.05% methyl methanesulfonate	[53]
	YPD + 100 mM hydroxyurea	[54]
	YPD + 60 μg/ml 6-azauracil	[55]