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. Author manuscript; available in PMC: 2007 Apr 6.
Published in final edited form as: Plasma Process Polym. 2006 Aug 15;3(6-7):485–497. doi: 10.1002/ppap.200600007

Figure 2.

Figure 2

Schematic illustration of the patterning procedure using masks and sequential plasma polymerization techniques. (a) PS petri dishes were exposed to the first of two sequential plasma polymerization depositions. (b) One macro (30 mm diameter solid disk) or multiple micropatterning (3 mm diameter copper TEM grid) mask(s) of various patterns were placed onto the plasma-deposited substrates and the (c) second plasma deposition (different chemistry) was performed. The mask(s) were then removed. (d) Plates were treated with 70% ethanol and UV light for 20 min. Plates were subsequently exposed to 10% serum containing media for 3–24 h before cell seeding. Plates were seeded with NIH 3T3 fibroblasts and (monocyte-) macrophage cells at various densities as described in Materials and Methods.