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. 2001 Feb;10(2):277–284. doi: 10.1110/ps.26401

Fig. 3.

Fig. 3.

UEA-II attenuates C3 deposition following endothelial oxidative stress (ELISA). C3 deposition following endothelial oxidative stress was measured by ELISA. C3 deposition following endothelial oxidative stress was significantly decreased in a concentration-dependent manner by treatment of HUVEC with UEA-II (IC50 ≈ 10 pmol/L). Data are normalized to the measured O.D. of untreated hypoxic/reoxygenated cells (O.D. at 450 nm = 0.77 ± 0.12) and expressed as percent inhibition. (n = 6, error bars = SEM, *P < 0.05 compared to vehicle).