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. Author manuscript; available in PMC: 2008 Oct 2.
Published in final edited form as: Nano Lett. 2006 Sep;6(9):2163–2165. doi: 10.1021/nl0615672

Figure 2.

Figure 2

SEM images showing patterned free-standing gold nanostructures on a silicon substrate after removing the epoxy with oxygen plasma at 0.9 Torr, 70 W for 20 min. The wall thickness and the height of the ring are about 40 nm and 500 nm respectively. (A) Ring; (B) square; (C) double ring. (In each set: the left image shows large arrays of gold nanostructures with different shapes; the top-right image shows the top view of the free-standing nanostructures; the bottom-right image shows the top view of the nanostructure lying on the silicon substrate on its side to indicate the height of the wall.)