Table 1.
Changes in C4d, C3b and C5b-9 deposition with chemical or mechanical stimulation of BMEC monolayers
| Baseline | TS03 | Shear | TS03+Shear | LPS | INF-γ | |
|---|---|---|---|---|---|---|
| C4d | 1 | 1.25±0.17* (n=4) | 1.33±0.28* (n=6) | 1.92±0.41* (n=4) | 1.09±0.25 (n=5) | 1.09±0.24 (n=5) |
| iC3b | 1 | 1.03±0.31 (n=8) | 0.83±0.57 (n=8) | 1.09±0.51 (n=8) | 1.01±0.12 (n=5) | 0.97±0.14 (n=5) |
| SC5b-9 | 1 | 1.09±0.30 (n=8) | 1.10±0.74 (n=8) | 1.17±0.57 (n=8) | 0.96±0.12 (n=5) | 1.00±0.20 (n=5) |
Results were normalized to baseline C4d, iC3b and SC5b-9 deposition observed on unstimulated BMEC monolayers and presented as mean±STD.
(indicates statistical significance P<0.05 by ANOVA).