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. 2009 May;150(1):12–26. doi: 10.1104/pp.108.134353

Table II.

Expression of RLK/Pelle genes under abiotic and biotic stress conditions

Response: Up-Regulation
Down-Regulation
Statistical Test: RLK/Pellea
Tandem/Nontandemb
RLK/Pellea
Tandem/Nontandemb
P O/Uc P O/Uc P O/Uc P O/Uc
Abiotic stress conditions
    UV-B 9.36E-25 O (28)d 0.002 O (37)e 4.58E-05 O (17)d 5.64E-04 U (6)e
    Wounding 1.61E-06 O (10) 0.237 (12) 8.42E-06 O (5) 0.062 (2)
    Drought 0.033f U (0.5) 0.244 (0) 0.158 (0.2) 0.139 (0.5)
    Cold (4°C) 0.718 (13) 0.690 (12) 2.84E-07 O (25) 0.064 (19)
    Heat 1.00E-04 U (10) 0.699 (9) 0.377 (21) 0.174 (17)
    Salt 0.771 (8) 0.141 (5) 0.561 (9) 0.479 (10)
    Osmotic 5.15E-04 O (19) 0.601 (19) 1.49E-06 O (24) 5.76E-04 U (14)
Biotic stress conditions
    Flg22 1.37E-47 O (18) 0.010f O (23) 0.279 (5) 0.008f U (1)
    GST-NPP1 2.51E-28 O (13) 0.012f O (17) 0.195 (3) 0.108 (1)
    HrcC− 1.31E-48 O (19) 6.62E-05 O (28) 0.002 O (6) 0.104 (3)
    P. infestans 2.52E-17 O (18) 0.076 (22) 0.008f O (12) 0.011f U (6)
    P. syringae pv phaseolicola 1.57E-44 O (25) 0.012f O (31) 0.029f O (10) 0.009f U (4)
    HrpZ 4.02E-43 O (23) 0.013f O (28) 0.555 (7) 0.008f U (2)
    AvrRpm1 3.18E-04 O (14) 0.676 (12) 0.024f O (12) 0.207 (9)
    DC3000 0.393 (12) 0.710 (12) 6.61E-07 O (20) 0.514 (17)
a

χ2 tests were conducted to determine whether RLK/Pelle genes were overrepresented among genes up- or down-regulated by stress conditions compared with all Arabidopsis genes.

b

χ2 tests were conducted to determine whether tandem RLK/Pelle genes were over-represented among genes up- or down-regulated by stress conditions compared with nontandem RLK/Pelles.

c

O and U indicate whether significant differences are due to overrepresentation or underrepresentation, respectively.

d

Numbers in parentheses indicate the percentage of RLK/Pelle genes that are up- or down-regulated.

e

Numbers in parentheses indicate the percentage of tandem RLK/Pelle genes that are up- or down-regulated.

f

Not significant after adjusting for multiple testing with sequential Bonferroni adjustment.