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. Author manuscript; available in PMC: 2010 Apr 1.
Published in final edited form as: Environ Sci Technol. 2009 Apr 1;43(7):2581–2588. doi: 10.1021/es8022978

Figure 2. Radical formation by structurally related compounds, relation to UV molar absorption coefficient (ε).

Figure 2

(A) radical yield after irradiation with a 309 nm cut-off filter (black bars) or a 280 nm cut-off filter (striped bars). The radical yield was obtained by double-integration of EPR spectra; relative radical yield: ratio of radical yield of each compound to radical yield of THF alone. (B) Radical yield correlated to UV absorption: the area under the absorption curve (ε) was determined by a Trapezoid integration; to estimate the actual light absorbed by the sample when employing a cutoff filter, an “adjusted-integration” was determined by the percent transmittance of the cutoff filter at a specific wavelength times the extinction coefficient of the compound at that wavelength in the integration. (a) 309 nm cut-off filter; (b) 280 nm cut-off filter.