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Adjusted XPS Atomic Concentrations (atom %) for UV- and Redox-Polymerized Bis-SorbPC Bilayers with the Si Wafer Contributions Removed Using Eq 1 and the PSLB Concentrations Renormalized to 100 atom %a
| C 1s | O 1s | N 1s | P 2p | |
|---|---|---|---|---|
| UV | ||||
| av | 75.2 | 21.5 | 1.1 | 2.2 |
| std dev | 2.5 | 1.7 | 0.5 | 0.5 |
| Redox | ||||
| av | 79.9 | 16.4 | 1.3 | 2.4 |
| std dev | 1.9 | 1.0 | 0.2 | 0.5 |
| Theory | ||||
| 74 | 22.2 | 1.9 | 1.9 | |
The theoretical values were determined from the stoichiometry of the bis-SorbPC molecule.
