Table 6.
Angle-Resolved XPS Results (atom %) for Bis-SorbPC Bilayers with and without Rho Determined at TOAs of 0°, 55°, and 70°, after the Subtraction of the Silicon Substrate Contributions (Silicon, SiO2)a
| sample | N 1s | C 1s | P 2p | O 1s |
|---|---|---|---|---|
| UV without Rho, 0° | 0.8 | 75.0 | 2.1 | 22.1 |
| UV without Rho 55° | 0.9 | 79.9 | 1.8 | 17.4 |
| UV without Rho 70° | 0.6 | 82.0 | 1.2 | 16.2 |
| UV with Rho 0° | 7.3 | 73.0 | 1.7 | 18.1 |
| UV with Rho 55° | 7.6 | 76.8 | 0.8 | 14.7 |
| UV with Rho 70° | 7.6 | 79.8 | 0.9 | 11.7 |
a
A slightly higher concentration of Rho was chosen for this experiment to enhance the effect of angle-dependent XPS analysis. The constant nitrogen concentration at all TOAs indicates that the nitrogen distribution is homogeneous across the lipid and protein layer, which shows that the nitrogen-rich protein is incorporated into, rather than adsorbed on top of, the PSLB.