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. Author manuscript; available in PMC: 2009 Oct 5.
Published in final edited form as: Surf Sci. 2008 Jul 15;602(14):2402–2411. doi: 10.1016/j.susc.2008.05.027

Fig. 1.

Fig. 1

The PECVD experimental set-up that was used for coating PECVD-Si films on Ti substrates. A photograph of the set-up is shown in (A). An illustration of the vapour delivery system is shown in (B). MFC denotes mass flow controller. An illustration of Ti samples (for PECVD-Si coating) mounted on the stage in the glass chamber of the Harrick radio-frequency plasma generator is shown in (C).