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. Author manuscript; available in PMC: 2009 Oct 5.
Published in final edited form as: Surf Sci. 2008 Jul 15;602(14):2402–2411. doi: 10.1016/j.susc.2008.05.027

Fig. 14.

Fig. 14

XPS survey spectra on commercial silicon and PECVD-Si-Ti (treated with 5 min of air/H2O2 plasma) after a TFAA reaction in solution. A spectrum of silicon reacted with TFAA for 5 min is shown in A and for 1 h in B and spectra of PECVD-Si-Ti reacted with TFAA for 5 min and 1 h are shown in C and D, respectively. The silicon used in this experiment was purchased from Virginia Semiconductor Inc. (Virginia). and was boron doped to a resistivity of 0.0005–0.001 Ω·cm.