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. Author manuscript; available in PMC: 2009 Oct 9.
Published in final edited form as: J Med Device. 2007 Sep 1;1(3):233–237. doi: 10.1115/1.2775937

Figure 1.

Figure 1

Schematic of the patterning technique. 1. Surface dissolution - Acetic acid is applied to the CG membrane surface. 2. Feature resolution - After the top layer of the CG membrane has been dissolved the silicon wafer with photoresist is positioned on the membrane surface and pressure is applied. 3. Feature stabilization - The system is immersed in glutaraldehyde to crosslink the membrane and to stabilize the patterned features. 4. Separation - The silicon wafer and CG membrane are separated resulting in a patterned CG membrane.