Figure 2.
Side view SEM of nanoimprint mold which consists of arrays of pillars etched in DLC through an HSQ mask. The height of the pillars is about 30nm and their diameter varies from ~10nm to ~37nm, depending on the applied electron dose.
Side view SEM of nanoimprint mold which consists of arrays of pillars etched in DLC through an HSQ mask. The height of the pillars is about 30nm and their diameter varies from ~10nm to ~37nm, depending on the applied electron dose.