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. Author manuscript; available in PMC: 2010 Oct 1.
Published in final edited form as: Nano Lett. 2009 Oct;9(10):3629–3634. doi: 10.1021/nl9018512

Figure 3.

Figure 3

Cross sectional SEM of imprinted PMMA with angle-evaporated Ti mask after descum. The nearly complete removal of PMMA from the patterned areas and the resultant undercut are clearly seen in the image.