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. Author manuscript; available in PMC: 2009 Oct 26.
Published in final edited form as: J Neurosci Methods. 2006 Oct 17;160(2):317–326. doi: 10.1016/j.jneumeth.2006.09.009

Figure 1. Cartoon illustrating fabrication steps used to produce masters for microcontact printing and scanning electron micrographs of molded PDMS stamps.

Figure 1

(A) Two different strategies – reflow and deep-etch – were used to produce support for the 200-µm long lines connecting to the electrode sites. The pink layers represent photoresist. The gray layers represent the silicon wafers. Masters fabricated using resist reflow (B) produced structures containing a sloping base to support the raised surfaces that will be used to transfer proteins to the surfaces of the MEAs. Masters fabricated using the double deep-etch (C) strategy produced raised features on a stepped base. Scale bar = 100 µm.