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. Author manuscript; available in PMC: 2010 Apr 29.
Published in final edited form as: ACS Appl Mater Interfaces. 2009 Apr 29;1(4):888–893. doi: 10.1021/am900013v

Figure 4.

Figure 4

Demonstration of pore alignment in nanoporous block polymer film. The film was used as a mask to etch the pits shown in this SEM image. The irregular pit shapes are likely due to product deposition during the etch.