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. 2009 Oct;4(10):948–953. doi: 10.4161/psb.4.10.9709

Figure 2.

Figure 2

An increase in silique number with sustained Bacillus subtilis (GB03) exposure (black bar) compared with GB03 withdrawn (WD, grey bar) at week two and water-treated controls (white bars). Representative images of inflorescence development with sustained (left), WD (center) and absent (right) GB03 exposures for plants 28 days after treatments are shown (A). Time of inflorescence initiation with sustained GB03 exposure (n = 16), WD (n = 16) and absent (n = 18) GB03 exposure (B). Siliques per plant collected at 8- (solid bar) and 10-weeks (diagonal bar) with GB03, WD and absence of GB03 treatment (n = 8) (C). Seed germination ratio and time after seeds planted from different treatments (sustained, n = 74; WD, n = 68; and absent GB03 exposure n = 71) (D). Different letters indicate significant differences between treatments (ANOVA, p ≤ 0.05).