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. Author manuscript; available in PMC: 2010 Mar 17.
Published in final edited form as: J Vac Sci Technol B Microelectron Nanometer Struct Process Meas Phenom. 2009;27(6):2795–2800. doi: 10.1116/1.3258146

Fig. 2.

Fig. 2

Fabrication process of the hollowed cuboid base: (a) spin coating of 50 μm thick SU-8, (b) patterning of the bottom face, (c) spin coating of 200 μm thick SU-8, and (d) patterning of the four sidewalls.