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. Author manuscript; available in PMC: 2010 Mar 17.
Published in final edited form as: J Vac Sci Technol B Microelectron Nanometer Struct Process Meas Phenom. 2009;27(6):2795–2800. doi: 10.1116/1.3258146

Fig. 4.

Fig. 4

SEM micrographs showing (a) the Si grating after the second oxidation and oxide etch step and (b) the final Si grating (after all oxidation and oxide etch steps) with ∼20 nm wide Si lines that is used to make the nanoslots.