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. Author manuscript; available in PMC: 2010 Apr 27.
Published in final edited form as: Optoelectron Mater Devices. 2008 Nov 18;7135:71350M. doi: 10.1117/12.807153

Fig. 2.

Fig. 2

Edge of a cryogenically-etched mold for a lens (left) and a waveguide (right). Larger scale ripple is the result of lithography problems, not limitations of the cryogenic process. The waveguide (right) still has the metal mask coating on the top along with some fragments around it, which are all removed by a wet etching process after the initial etch. Note the highly vertical sidewalls in of the lens, and the excellent smoothness of the waveguide