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PC and magnesium-induced Bs-FtsZ assemblies. Electron micrograph of negatively stained polymers formed by Bs-FtsZ (10 μm) in Hepes250 assembly buffer with 0.1 mm GMPCPP (A), 0.1 mm GMPCPP and 20 μm PC (B), 0.1 mm GMPCPP and 10 mm MgCl2 (C), and 0.1 mm GMPCPP and 10 mm MgCl2 and 20 μm PC (D). The bar indicates 200 nm.
