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. 2010 Mar 22;107(15):6711–6715. doi: 10.1073/pnas.0914117107

Fig. 2.

Fig. 2.

Evaluation of the Al2O3 nanoribbons as dielectric material. (A) TEM image (SAED pattern, Inset) and (B) HRTEM image of an Al2O3 nanoribbon show nearly perfect crystalline structure with α-Al2O3 structure. (C) AFM image of an Al2O3 nanoribbon with thickness approximately 50 nm. The image area is 5 μm × 5 μm. (D) AFM image of the surface of the Al2O3 nanoribbon, highlighting the smooth surface with a rms roughness < 0.2 nm. The image area is 250 nm × 250 nm. (E) The schematic device diagram (Inset) and SEM image of an Al2O3 nanoribbon metal-insulator-metal (MIM) device. (F) Current density-electric field (J-E) curve of an MIM device made from an Al2O3 nanoribbon, and the inset shows the corresponding (F–N) curve.