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. 2009 Jan 24;4(4):364–370. doi: 10.1007/s11671-009-9255-4

Figure 1.

Figure 1

Fabrication process flow for tapered subwavelength antireflection structures:aPt/Pd alloy thin film deposition with a thickness of 10 nm;bthermally dewetted Pt/Pd alloy nanodot etch mask formed at an elevated temperature; andcformation of tapered subwavelength antireflection structures after RIE