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. Author manuscript; available in PMC: 2010 Oct 29.
Published in final edited form as: Nat Protoc. 2009 Oct 29;4(11):1681–1698. doi: 10.1038/nprot.2009.176
Etch mode Passivation mode
Process time: 6 s 4.5 s
Overrun: 0.5 s 0 s
Platen generator power: 80 W 60 W
Coil generator power: 600 W 600 W
Gas: SF6 (70 sccm) C4F8 (35 sccm)
Etch rate: 1.47 μm/min N/A