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. 2010 Jun 8;5(9):1456–1463. doi: 10.1007/s11671-010-9661-7

Figure 1.

Figure 1

Fabrication procedures of quasi-beehive Si nanostructures and self-organized nanogrids: a SiGe thin film is deposited on Si substrate; b SiGe islands arrays are formed via the annealing treatment; c then plasma etching (RIE); d finally the self-organized nanostructures are fabricated