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. Author manuscript; available in PMC: 2011 Sep 7.
Published in final edited form as: Langmuir. 2010 Sep 7;26(17):14126–14134. doi: 10.1021/la102315j

Figure 2.

Figure 2

Thickness, contact angle and RMS roughness (RRMS) with their corresponding standard deviation of (a) PU and (b) PS based films including bare films (PU/PS), oxidized films (OX-PU/OX-PS), dextranized films in air (DEX-PU/DEX-PS) and dextranized PU films in PBS buffer (DEX-PU-WET/DEX-PS-WET). The film thickness decreases upon oxygen plasma treatment but increases with photochemical attachment of AZDEX. On the other hand, the contact angle decreases drastically with oxygen plasma treatment and remains low with AZDEX attachment. The RRMS remains unaltered after oxygen plasma treatment. For dried DEX-PU, the RRMS increases to 2 ± 1 nm but reduces to 1.4 ± 0.5 nm in buffer whereas for dried DEX-PS, the RRMS increases to 1.4 ± 0.5 nm but returns to 0.6 ± 0.1nm in buffer.