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. Author manuscript; available in PMC: 2011 Sep 7.
Published in final edited form as: Langmuir. 2010 Sep 7;26(17):14126–14134. doi: 10.1021/la102315j

Figure 4.

Figure 4

AFM images of photopatterned dextran on (a, b, c) PU and (d, e, f) PS: (a, d) topography, (b, e) line scan across while line in (a, d) and (c, e) 3D topographic image of 80×80 μm2 scan size (z scale: 20 nm for PU, z scale: 15 nm for PS). A photomask is used to pattern dextran on the substrate. The unmasked regions on PU (photochemically bound dextran, DEX-PU) display dextran clusters whereas smoother regions correspond to the masked regions (“protected”, OX-PU). The unmasked regions on PS (photochemically bound dextran, DEX-PS) display a layer of dextran (1.3 ± 0.4 nm) with uniform dextran features whereas smoother regions correspond to the masked regions (“protected”, OX-PS).