Table 1.
References | Preparation Procedure | Sample | Band Gap a(eV) | |
---|---|---|---|---|
Ed | Ei | |||
e[2] | Polyol | Polycrystalline CeO2 | 3.19 | N.A. |
CeO2 nanospheres (80–100 nm), | 3.46 | |||
Microrods (d WD several100 nm; d L 15 to 20 μm, d AR 25 to 33), | 3.62 | |||
Spindle-like (d WD several 100 nm, d L 2 to 4 μm, d AR 4-8) | 3.36 | |||
[49] | Hydrothermal | Spindle like (d WD 800 nm and d L 5 μm) | 3.55 | N.A. |
[50] | Hydrothermal | CeO2 prism-like mesocrystal Bulk CeO2 |
3.02 3.19 |
N.A. |
[51] | Spray pyrolysis | CeO2 films (cerium chloride) (cerium nitrate) | 3.6 3.53 |
N.A. |
[52] | Electron beam evaporation; Ion beam assisted deposition | Nanostructured CeO2−x | 3.48 | 3.18 |
e[11] | Ultrasonication | CeO2 nanorods (d AR 10 to 15:1, d L 50–150 nm) | 2.9 | 2.67 |
[53] | Microemulsion | Ceria ultrafine nanostructure | 3.44 2.6 |
2.87 2.73 |
[54] | Pulsed electron beam | CeO2 nanocrystalline films | N.A. | 2.58 |
[56–58] | Physical vapor-deposited | CeO2 films | N.A. | 3.15–3.5 |
[59] | Spray deposition | CeO2 films | N.A. | 3.06–3.08 |
[60] | Sol-gel method | CeO2 films | N.A. | 3.03–3.07 |
Notes:
According to the solid band theory for a semiconductor (hν)n = constant(hν – Eg), where hυ is the photo energy, α is the absorption coefficient, constant is relative to the material, Eg is the band gap;
Ed: Band gap energy for direct transitions in where n = 2; Ei: Band gap energy for indirect transitions in where n = 1/2;
AR = aspect ratio; L = length; N.A. = not available; WD = width;
Surfactant method.