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. 2010 Nov 22;1:24–47. doi: 10.3762/bjnano.1.5

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Copyright © 2010, Wiedwald et al.

This is an Open Access article under the terms of the Creative Commons Attribution License (https://creativecommons.org/licenses/by/2.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

The license is subject to the Beilstein Journal of Nanotechnology terms and conditions: (https://www.beilstein-journals.org/bjnano/terms)

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CoCl₂ loaded PS(1779)-b-P2VP(857) reverse micelles deposited at different dip-coating velocities; (a) and (b) show the SEM micrographs at dip-coating velocities of 5 mm/min and 45 mm/min, respectively. The corresponding distributions of the interparticle distance D and Gaussian fits are shown in (c). Panel (d) shows the interparticle distance as function of the 3^rd root of the dip-coating velocity in the range of 1–90 mm/min. The dashed line is a linear fitting of the five central points.