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. Author manuscript; available in PMC: 2011 Apr 14.
Published in final edited form as: Lab Chip. 2010 Feb 10;10(9):1174–1181. doi: 10.1039/b921592a

Figure 7.

Figure 7

The deposition of silicon dioxide on membrane structures can be used to reduce pore width. At a deposition rate of approximately 60nm/min on flat horizontal surfaces, deposition on vertical, pore sidewalls is considerably less. Pores are shown after (a) 2, (b) 4, (c) 6, and (d) 8 minutes of PECVD silicon dioxide deposition. The retention of green fluorescent protein was observed after 5 minutes in reaction vessels coated with silicon dioxide for (e) 4 minutes (100ms digital camera exposure) and (f) 6 minutes (50ms digital camera exposure). Each of the devices shown was filled with the same concentration of GFP.