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. Author manuscript; available in PMC: 2012 Mar 28.
Published in final edited form as: J Mater Chem. 2011 Mar 28;21(12):4371–4376. doi: 10.1039/c0jm04153j

Figure 5.

Figure 5

Transmission confocal images revealing differential resistance of DTC- and thiol-passivated Au substrates to chemical etchant (cysteamine). (a,b) Binary patterns comprised of diC10-DTC and C12 thiol, before and 3 h after exposure to etchant. (c,d) Binary patterns comprised of PEI-DTC and mEG3-C11 thiol, before and 5 h after exposure to etchant. Representative linescan profiles (yellow) shown at upper right. (e) Relative rate of substrate etching as a function of exposure time to etchant.