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Sample description of vertical SiNWs analyzed by the CP-AFM technique
| Sample name | Growth temp. (°C) | Description | Post-annealing treatment | Nominal impurity concentration |
|---|---|---|---|---|
| CD-08-001 | 500 | Undoped SiNWs/n-type Si (100) | - | Undoped |
| CD-08-125 | 500 | Doped SiNWs/n-type Si (100) | 5 min at 750°C | [P] ≈ 1 × 1018 cm-3 |
| CD-08-021 | 500 | Doped SiNWs/n-type Si (100) | 5 min at 750°C | [P] ≈ 1 × 1020 cm-3 |
