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. 2011 Apr 7;6(1):301. doi: 10.1186/1556-276X-6-301

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Copyright ©2011 Batista et al; licensee Springer.

This is an Open Access article distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/2.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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XRD spectra of VO₂films deposited by (a1-a3, b4-b6) DC and (c7-c10) pulsed-DC sputtering, doped with different dopant element and contents: (a1) pure VO₂, (a2) V_0.97W_0.03O₂, and (a3) V_0.95W_0.05O₂; (b4) V_0.97Mo_0.03O₂, (b5) V_0.94Mo_0.06O₂, and (b6) V_0.89Mo_0.11O₂; (c7) pure VO₂, (c8) V_0.96Nb_0.04O₂, (c9) V_0.93Nb_0.07O₂, and (c10) V_0.89Nb_0.11O₂.