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. 2011 Jul 12;6(1):446. doi: 10.1186/1556-276X-6-446

Figure 3.

Figure 3

Dense line arrays with a period of 20 nm exposed at 20 keV and developed at room temperature for 90 s using (a) xylene; (b) chlorobenzene; and (c) cyclohexane. The lines in (c) collapsed due to capillary force during resist drying.