fig. 4.

The fabrication of microdisks (MDs) by optical lithography and magnetron sputtering. (a,b) The process starts with photoresist spin coating on a silicon wafer; (c) a mask is placed in contact with the layer of pre-packed photoresist and illuminated with UV light. (d) An organic solvent dissolves and removes unexposed photoresist. (e) Finally, magnetron sputtering is used to deposit 5 nm underlayer gold, followed by 60 nm of permalloy, and topped with another 5 nm of gold layer. (f) The disks are released from the wafer by lift-off process. Reprinted from NatMater, Vol. 9, Kim D-H et al., Biofunctionalized magnetic-vortex microdiscs for targeted cancer-cell destruction, supplementary information P3. Copyright (2010), with permission from Nature Publishing Group.