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. 2011 Oct 31;6(1):568. doi: 10.1186/1556-276X-6-568

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Copyright ©2011 Pedersen et al; licensee Springer.

This is an Open Access article distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/2.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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XRD of ZnO films deposited on ceramic substrates. Normalized XRD of ZnO films deposited on (a) p-type Si(100), (b) c-plane sapphire, and (c) fused quartz at substrate temperature of 330°C.