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. 2011 May 4;11(5):4943–4971. doi: 10.3390/s110504943

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© 2011 by the authors; licensee MDPI, Basel, Switzerland.

This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution license (http://creativecommons.org/licenses/by/3.0/).

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Figure 8. — Porous alumina and gold CMOS electrode after deposition of platinum black at 50 mA·cm⁻². The platinum is within the defined pad area and is flush with the passivation surface. Scale bar is 2 μm.