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. 2011 Nov 21;12(11):8259–8274. doi: 10.3390/ijms12118259

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© 2011 by the authors; licensee MDPI, Basel, Switzerland.

This article is an open-access article distributed under the terms and conditions of the Creative Commons Attribution license (http://creativecommons.org/licenses/by/3.0/).

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Solvent exposure of hydrophobic residues (LVFFA) as a function of the distance between the hydrogen and oxygen atom involved in the β-turn. Graphs (a,c) correspond to the solvent exposure of hydrophobic residues, S_LVFFA. Graphs (b,d) correspond to the fraction of the solvent accessible surface of S_LVFFA to the total solvent accessible surface area (f_LVFFA).

Solvent exposure of hydrophobic residues (LVFFA) as a function of the distance between the hydrogen and oxygen atom involved in the β-turn. Graphs (a,c) correspond to the solvent exposure of hydrophobic residues, S_LVFFA. Graphs (b,d) correspond to the fraction of the solvent accessible surface of S_LVFFA to the total solvent accessible surface area (f_LVFFA).