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. Author manuscript; available in PMC: 2012 Oct 1.
Published in final edited form as: Dev Dyn. 2011 Sep 7;240(10):2233–2244. doi: 10.1002/dvdy.22729

Table 5.

Face landmarks.

Number Landmark Description
1 (R/L) Future site of primary choanae
3 (R/L) Maximum of superior-lateral curvature of lateral nasal process (frontal view)
4 (R/L) Most lateral point (maximum of curvature) on lateral nasal process (frontal view)
5 (R/L) Maximum of inferior-lateral curvature of lateral nasal process (frontal view)
6 (R/L) Most lateral point (maximum of curvature) on maxillary process (frontal view)
7 (R/L) Most inferior-medial point of lateral nasal process
8 (R/L) Most inferior-lateral point of medial nasal process
9 (R/L) Most inferior point on medial nasal process
10 (R/L) Maximum of curvature of lateral nasal process along lateral edge of nasal pit
11 (R/L) Minimum of curvature of medial nasal process along medial edge of nasal pit
12 (R/L) Most superior point of nasal placode/pit (junction of medial and lateral nasal
processes)
13 (R/L) Maximum of superior-medial curvature of medial nasal process (frontal view)
14 (R/L) Maximum of inferior-medial curvature of medial nasal process (frontal view)
15 (M) Most inferior point of junction of the medial nasal processes
16 (M) Most superior point of junction of the medial nasal processes
20 (R/L) Maximum of curvature of medial nasal process (lateral view)
21 (R/L) Maximum of curvature of lateral nasal process (lateral view)
26 (R/L) Most posterior point of the junction between the maxillary process and eye cup
27 (R/L) Maximum of the anterior-inferior curvature of the maxillary process
29(R/L) Junction of the maxillary process, lateral nasal process and eye cup