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. 2012 Jan 5;7(1):26. doi: 10.1186/1556-276X-7-26

Table 1.

Sputtering conditions of ZnS films

Parameter Condition
Target ZnS (99.99% pure)
Substrate Corning E2000 glass
RF power 120 W
Sputtering gas Pure argon (55 sccm)
Deposition time 20 min
Sputtering pressure 3 × 10-2 Torr
Substrate temperature 100°C, 200°C, 250°C, 300°C, 350°C, 400°C
Target to substrate distance 50 mm