TABLE I.

Fabrication protocol used to form cascade SU-8 master on different substrates.

	PEI substrate	Glass substrate
Spinning of SU-8 2010	3000 rpm (30 s)	3000 rpm (30 s)
Prebake	105 °C (8 min)	100 °C (6 min)
UV expose	150 mJ/cm2	150 mJ/cm2
Post bake	110 °C (10 min)	105 °C (10 min)
Covering with Teflon tape	Half of the slide	Half of the slide
Spinning of SU-8 2035	1400 rpm (30 s)	1400 rpm (30 s)
Spreading of SU-8 2035	2 min	2 min
Prebake	105 °C (15 min)	100 °C (12 min)
Spinning of SU-8 2010	3000 rpm (30 s)	3000 rpm (30 s)
Prebake	75 °C (5 min) and 105 °C (15 min)	70 °C (5 min) and 100 °C (12 min)
UV expose	450 mJ/cm2	450 mJ/cm2
Post bake	110 °C (15 min)	105 °C (15 min)
Develop	25 min	15 min
Hard bake	200 °C (15 min)	200 °C (15 min)