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. 2011 Nov 16;6(1):597. doi: 10.1186/1556-276X-6-597

Figure 4.

Figure 4

SEM images of SiNWs formed on the blank Si wafer and on lithographically defined areas. Cross-sectional SEM images of SiNWs fabricated on non-patterned Si areas (a) and on 100 × 100-μm2 lithographically defined areas (b).